Control of crystallinity in sputtered Cr–Ti–C films
نویسندگان
چکیده
The influence of Ti content on crystallinity and bonding of Cr-Ti-C thin films deposited by magnetron sputtering have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy, and Raman spectroscopy. Our results show that binary Cr-C films without Ti exhibit an amorphous structure with two non-crystalline components; amorphous CrCx and amorphous C (a-C). The addition of 10-20 at% Ti leads to a crystallization of the amorphous CrCx and the formation of a metastable cubic (Cr1-xTix)Cy phase. The observation was explained based on the tendency for formation of crystalline carbide films among the 3d transition metals. The mechanical properties of the films determined by nanoindentation and microindentation were found to be strongly dependent on the film composition in terms of hardness, elasticity modulus, H/E ratio, and crack development.
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